{"product_id":"ieej-pst10055","title":"ハイパワーパルススパッタ（HPPS）グロー放電プラズマの放電開始特性","description":"\u003cp\u003e\u003cstrong\u003eカテゴリ: \u003c\/strong\u003e研究会(論文単位)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e論文No: \u003c\/strong\u003ePST10055\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eグループ名: \u003c\/strong\u003e【A】基礎・材料・共通部門 プラズマ研究会\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e発行日: \u003c\/strong\u003e2010\/08\/12\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eタイトル(英語): \u003c\/strong\u003eDischarge Inception characteristics of High Power Pulse Sputter (HPPS) Glow Discharge plasma\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名: \u003c\/strong\u003e東 欣吾(兵庫県立大学),行村 建(産業技術総合研究所),中野 禅(産業技術総合研究所),小木曽 久人(産業技術総合研究所),原 史朗(産業技術総合研究所)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名(英語): \u003c\/strong\u003eKingo Azuma(University of Hyogo),Ken Yukimura(National Institute of Advanced Industrial Science and Technology),Shizuka Nakano(National Institute of Advanced Industrial Science and Technology),Hisato Ogiso(National Institute of Advanced Industrial Science and Technology),Shiro Hara(National Institute of Advanced Industrial Science and Technology)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eキーワード: \u003c\/strong\u003eパルス放電プラズマ|グロー放電|ペニング放電|スパッタ|プラズマイオンプロセス|(Pulsed discharge plasma|Glow discharge|Penning discharge|Sputter|Plasma ion process\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e要約(日本語): \u003c\/strong\u003eハイパワーパルススパッタ(HPPS)グロ－放電はイオン化率の高い金属プラズマを生成する。今回はパルス放電の繰り返し周波数を80Hzに下げ、周辺プラズマが放電に影響を及ぼさない環境下で放電させHPPSグロ－放電の放電開始特性を測定した。その結果について述べる。\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e要約(英語): \u003c\/strong\u003eHigh power pulse sputter (HPPS) glow discharge is able to generate high-ionized metal plasma with instantaneous power consumption of several tens of kilowatts. HPPS glow plasma is generated at the narrow gap between two confrontation metal-plate cathode targets with a magnetic field perpendicular to the targets. A plasma source is compact in size (60 × 60 × 60 mm3) with a gap length of 10 mm and a magnetic field strength of 0.3 T. In this report, The HPPS plasma source is applied low-repetition negative high voltage pulses and HPPS discharge Inception characteristics are investigated. The HPPS plasma is generated at 5.7 Pa and more pressures in the ambient argon gas with the voltage of 800 V, the pulse duration of 30 s and repetition frequency of 80Hz. The ignition time from on the leading edge of pulse is decreased with gas pressure.\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e原稿種別: \u003c\/strong\u003e日本語\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003ePDFファイルサイズ: \u003c\/strong\u003e648 Kバイト\u003c\/p\u003e","brand":"IEEJ-PDF","offers":[{"title":"PDFダウンロード（一般価格330円\/会員価格220円） \/ A4 \/ 5","offer_id":46359470047471,"sku":"IEEJ-PST10055-PDF","price":330.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0718\/9512\/2159\/files\/IEEJ-PDF_23ea86ea-d9b5-46ea-9e44-1c6d921c4d0e.png?v=1743482817","url":"https:\/\/ieej.bookpark.ne.jp\/products\/ieej-pst10055","provider":"電気学会 電子図書館","version":"1.0","type":"link"}