{"product_id":"ieej-pst13006","title":"チタン薄膜合成に向けたホロー陰極スパッタ実験と関連現象","description":"\u003cp\u003e\u003cstrong\u003eカテゴリ: \u003c\/strong\u003e研究会(論文単位)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e論文No: \u003c\/strong\u003ePST13006\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eグループ名: \u003c\/strong\u003e【A】基礎・材料・共通部門 プラズマ研究会\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e発行日: \u003c\/strong\u003e2013\/03\/15\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eタイトル(英語): \u003c\/strong\u003eI. Hollow Cathode Sputtering Experiments for Titanium Thin Films and Related Phenomena\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名: \u003c\/strong\u003eSchrittwieser Roman(インスブルック大学)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名(英語): \u003c\/strong\u003eSchrittwieser Roman(University of Innsbruck)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eキーワード: \u003c\/strong\u003eHollow cathode discharge|Sputtering source|TiO2|Transparent conductive film\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e要約(日本語): \u003c\/strong\u003eチタン薄膜合成に向けたホロー陰極スパッタ実験において，チタン製のホロー陰極を用いたアルゴンガス直流放電の基礎現象を述べ，酸素ガスの下では，このスパッタ源を用いると酸化チタンの透明導電膜が合成できる可能性を報告する．\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e要約(英語): \u003c\/strong\u003eAn overview is given on the hollow cathode (HC) research carried out at the University of Innsbruck. This research was devoted to the investigation of (i) the basic properties of the HC as low-cost sputtering source for titanium and other metals, of (ii) the HC as sputtering source for titanium in combination with polystyrene and of (iii) related phenomena such as detached luminous phenomena. Mostly argon was used as working gas. A part of the investigations (i) were carried out in a HC with an additional cavity which further enhances the pendulum effect of the electrons. Thereby the production of positive argon ions and the sputtering rate could be strongly enhanced. The objective of investigation (ii) was to obtain a polystyrene film in mixture with titanium oxide (TiO2) groups in a very simple HC device. Monomer vapor was propagated by argon gas flow into the HC at a working pressure of about 0.1 mbar. The substrate was a silicon wafer. Another type of HC (iii) consisted of a simple hollow cylinder of Ti embedded in a ceramic screw cap of a conventional DII fuse, screwed into a standardized Edison E27 screw socket. Two different modes of operation were observed: a low-current discharge with the typical pink-bluish argon glow and the high-current HC discharge mode with an intensive glow at the upper end of the Ti cathode. Under certain conditions, this glow was observed to float freely between cathode and anode ring. For the future we plan to use this hollow cathode sputtering source for the synthesis of TiO2 transparent conductive films. \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e原稿種別: \u003c\/strong\u003e日本語\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003ePDFファイルサイズ: \u003c\/strong\u003e1,736 Kバイト\u003c\/p\u003e","brand":"IEEJ-PDF","offers":[{"title":"PDFダウンロード（一般価格330円\/会員価格220円） \/ A4 \/ 6","offer_id":46359628808431,"sku":"IEEJ-PST13006-PDF","price":330.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0718\/9512\/2159\/files\/IEEJ-PDF_76aa299a-151f-486f-9ea4-4c475aef5285.png?v=1743489671","url":"https:\/\/ieej.bookpark.ne.jp\/products\/ieej-pst13006","provider":"電気学会 電子図書館","version":"1.0","type":"link"}