{"product_id":"ieej-sp19022","title":"Oxide Layer Removal Speed of Vacuum Arc Cathode Spot Applied by Alternating Magnetic Field","description":"\u003cp\u003e\u003cstrong\u003eカテゴリ: \u003c\/strong\u003e研究会(論文単位)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e論文No: \u003c\/strong\u003eSP19022\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eグループ名: \u003c\/strong\u003e【B】電力・エネルギー部門 開閉保護研究会\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e発行日: \u003c\/strong\u003e2019\/07\/24\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eタイトル(英語): \u003c\/strong\u003eOxide Layer Removal Speed of Vacuum Arc Cathode Spot Applied by Alternating Magnetic Field\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名: \u003c\/strong\u003eMasashi Shimazaki(Tokyo City University),Yuriko Takeda(Tokyo City University),Yoshifumi Maeda(Tokyo City University ),Kenji Suzuki(Tokyo City University),Toru Iwao(Tokyo City University)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名(英語): \u003c\/strong\u003eShimazaki Masashi(Tokyo City University),Takeda Yuriko(Tokyo City University),Maeda Yoshifumi(Tokyo City University),Suzuki Kenji(Tokyo City University),Iwao Toru(Tokyo City University)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eキーワード: \u003c\/strong\u003eａｒｃ　ｄｉｓｃｈａｒｇｅ|ｃａｔｈｏｄｅ　ｓｐｏｔ|ｏｘｉｄｅ　ｌａｙｅｒ　ｒｅｍｏｖａｌ|ｉｍａｇｅ　ｐｒｏｃｅｓｓｉｎｇ|ｐｌａｓｍａ|ａｌｔｅｒｎａｔｉｎｇ　ｍａｇｎｅｔｉｃ　ｆｉｅｌｄ|arc discharge|cathode spot|oxide layer removal|image processing|plasma|alternating magnetic field\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e要約(日本語): \u003c\/strong\u003eThe movement of the vacuum arc cathode spot is random manner. For this reason, the movement in the single direction can be controlled by applying the transverse magnetic ?eld. However, the range of surface treatment can not be broadened because it is the single direction. Therefore, the back and forth movement of the cathode spot should be needed to control to apply the alternating magnetic ?eld. In this paper, the movement of cathode spot applied by the alternating magnetic ?eld was elucidated. As a result, the movement of the cathode spot went back and forth, and the speed did not change with changing the magnetic ?eld.\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e要約(英語): \u003c\/strong\u003eThe movement of the vacuum arc cathode spot is random manner. For this reason, the movement in the single direction can be controlled by applying the transverse magnetic ?eld. However, the range of surface treatment can not be broadened because it is the single direction. Therefore, the back and forth movement of the cathode spot should be needed to control to apply the alternating magnetic ?eld. In this paper, the movement of cathode spot applied by the alternating magnetic ?eld was elucidated. As a result, the movement of the cathode spot went back and forth, and the speed did not change with changing the magnetic ?eld.\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e原稿種別: \u003c\/strong\u003e英語\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003ePDFファイルサイズ: \u003c\/strong\u003e1,331 Kバイト\u003c\/p\u003e","brand":"IEEJ-PDF","offers":[{"title":"PDFダウンロード（一般価格330円\/会員価格220円） \/ A4 \/ 4","offer_id":46390804513007,"sku":"IEEJ-SP19022-PDF","price":330.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0718\/9512\/2159\/files\/IEEJ-PDF_e29f47a1-b052-4380-a0ea-112a014f2ef6.png?v=1744604517","url":"https:\/\/ieej.bookpark.ne.jp\/products\/ieej-sp19022","provider":"電気学会 電子図書館","version":"1.0","type":"link"}