{"product_id":"ieej-spc08128","title":"A new robust control for the RF impedance matcher for plasma processing","description":"\u003cp\u003e\u003cstrong\u003eカテゴリ: \u003c\/strong\u003e研究会(論文単位)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e論文No: \u003c\/strong\u003eSPC08128\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eグループ名: \u003c\/strong\u003e【D】産業応用部門　半導体電力変換研究会\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e発行日: \u003c\/strong\u003e2008\/09\/26\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eタイトル(英語): \u003c\/strong\u003eA new robust control for the RF impedance matcher for plasma processing\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名: \u003c\/strong\u003eYuuki Hirose(Yokohama National University),Atsuo Kawamura(Yokohama National University),Atsushi Takayanagi(Kyosan),Koichi Takada(Kyosan)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e著者名(英語): \u003c\/strong\u003eYuuki Hirose(Yokohama National University),Atsuo Kawamura(Yokohama National University),Atsushi Takayanagi(Kyosan),Koichi Takada(Kyosan)\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003e原稿種別: \u003c\/strong\u003e日本語\u003c\/p\u003e\u003cp\u003e\u003cstrong\u003ePDFファイルサイズ: \u003c\/strong\u003e414 Kバイト\u003c\/p\u003e","brand":"IEEJ-PDF","offers":[{"title":"PDFダウンロード（一般価格330円\/会員価格220円） \/ A4 \/ 7","offer_id":46372907450607,"sku":"IEEJ-SPC08128-PDF","price":330.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0718\/9512\/2159\/files\/IEEJ-PDF_d4fc482e-6857-4690-bbc7-a9baa374e610.png?v=1744005270","url":"https:\/\/ieej.bookpark.ne.jp\/products\/ieej-spc08128","provider":"電気学会 電子図書館","version":"1.0","type":"link"}