AN OPTIMIZATION TOOL FOR 3D LITHOGRAPHY UTILIZING DMD-BASED MASKLESS EXPOSURE SYSTEM
AN OPTIMIZATION TOOL FOR 3D LITHOGRAPHY UTILIZING DMD-BASED MASKLESS EXPOSURE SYSTEM
カテゴリ: 部門大会
論文No: 20pm3-PS023
グループ名: 第31回「センサ・マイクロマシンとその応用システム」シンポジウム論文集
発行日: 2014/10/14
タイトル(英語): AN OPTIMIZATION TOOL FOR 3D LITHOGRAPHY UTILIZING DMD-BASED MASKLESS EXPOSURE SYSTEM
著者名: MA Xiaoxu (Kyoto University), Y. Kato(Kyoto University),Y. Hira(Kyoto University),F.V. Kempen(Delft University of Technology),F.V. Keulen(Delft University of Technology), T. Tsuchiya(Kyoto University),O. Tabata(Kyoto University)
キーワード: 3D Microstructuring,DMD maskless lithography,Optimization,Lithography simulation,Thick photoresist
要約(英語): A straightforward “input target-output parameters” computational optimization approach is presented for 3D microstructuring utilizing DMD optical lithography. This numerical optimization based on lithography simulation and sensitivity analysis can automatically optimize fabrication parameters for target 3D microstructure. Validity of the proposed approach has been successfully verified by experiments.
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