酸化膜厚さ変化時における真空アーク陰極点への酸化膜蒸気混入が及ぼす酸化膜除去過程の変化

カテゴリ: 部門大会

論文No: 29

グループ名: 【B】平成25年電気学会電力・エネルギー部門大会

発行日: 2013/08/27

タイトル(英語): Change of Oxide Layer Removal Process Affected by Vacuum Arc Cathode Spot with Vapor from Oxide Layer with Changing Oxide Layer Thickness

著者名: 山本 真司(東京都市大学),光安 枝里子(東京都市大学),岩尾 徹(東京都市大学),湯本 雅恵(東京都市大学)

著者名(英語): Shinji Yamamoto(Tokyo City University),Eriko Mitsuyasu(Tokyo City University),Toru Iwao(Tokyo City University),motoshige Yumoto(Tokyo City University)

キーワード: 真空アーク|陰極点|表面処理|金属蒸気|画像処理|vacuum arc|cathode spot|surface treatment|metal vapor|image processing

要約(日本語): A remarkable characteristic of a vacuum arc cathode spot is that the cathode spot moves around on the metal surface. A cathode spot can remove an oxide layer. However, the influence of an oxide layer on cathode spot movement remains unclear. As described herein, the each state ratio of oxide layer removal process affected by vacuum arc cathode spot with vapor from oxide layer with changing oxide layer thickness was elucidated. Experiments were performed using a SS400 cathode and a cylindrical copper anode. A high-speed video camera recorded the cathode spot movement with ND and band path filter. Then, the obtained images were analyzed using plasma image processing. The cathode spots always moved boundaries between the oxide layer and processed layer; however, the split and high speed movement occur on the bulk. The oxide layer plays an important role for cathode spot existence because of oxide layer vaporization. The movement speed of cathode spot affected by the oxide layer thickness changes the supply process of vapor from oxide layer and metal surface. Therefore, the each state ratio of the cathode spot changes with oxide layer thickness.

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