【Invited】Imaging of nanopatterns assisted by polymeric microstructures produced by proton beam writing

カテゴリ：部門大会

論文No：3-D-a1-2

グループ名：【A】令和７年電気学会基礎・材料・共通部門大会

発行日：2025/8/27

タイトル(英語)：

著者名：Puttaraksa Nitipon(Shibaura Institute of Technology), Sano Taichi(1Shibaura Institute of Technology), Shiraishi Yuto(Shibaura Institute of Technology), Kosumsupamala Kunpisit(Shibaura Institute of Technology), Seki Hironori(Shibaura Institute of Technology), Nishikawa Hiroyuki(Shibaura Institute of Technology), Okubo Shota(Mie University), Tsuji Akihiro(Mie University), Matsui Tatsunosuke(Mie University)　

著者名(英語)：

キーワード：Proton beam writing,Microstructure-assisted microscopy

要約(日本語)：It has been realized that the nature of diffraction of light in an optical microscope causes a challenge in imaging nanometer-sized structures/patterns below ~200 nm by using visible light. To date, many approaches have practically been demonstrated to solve this issue. Our research team has used proton beam writing to create microstructures of the polymer resists directly on the Blu-ray disc surfaces to assist in nanopattern imaging. The performance of this nanoimaging assistance has been explored under a laser confocal microscope. We will present this investigation in this meeting.

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