X-Ray Photoelectron Spectroscopy Study of Native Metal oxide Surface.

カテゴリ: 部門大会

論文No: OS3-5

グループ名: 【C】平成27年電気学会電子・情報・システム部門大会講演論文集

発行日: 2015/08/27

タイトル(英語): X-Ray Photoelectron Spectroscopy Study of Native Metal oxide Surface.

著者名: Susumu Takemura(Kanto-Gakuin University),Atsuro Ishii(Kanto-Gakuin University),Hitoshi Kato(Kanto-Gakuin University),Youhei Watanabe(Kanto-Gakuin University),Hiroaki Kobe(Kanto-Gakuin University),Tamoyasu Hiramatsu(Kanto-Gakuin University)

著者名(英語): Susumu Takemura(Kanto-Gakuin University),tsuro Ishii(Kanto-Gakuin University),Hitoshi Kato(Kanto-Gakuin University),Yohei Watanabe(Kanto-Gakuin University),Hiroaki Kobe(Kanto-Gakuin University),Tomoyasu Hiramatsu(Kanto-Gakuin University)

要約(日本語): The interface structure of metal oxide surface such as native aluminium surface and conducting polymer such as poly-thiophene films were investigated with FT-IR, XPS, PL and DFM. Metal oxide layer such as native aluminum and silicon surface surfaces were prepared by several oxidize conditions such as incubation in room atmosphere, electrochemical anodize and chemical reaction. Conducting polymer was fabricated on metal oxide surface by spin coating methods under room condition. The result of experiment shows the differences of oxide surface structures in several fabrication methods. Furthermore the authors discuss the application using metal oxide surface.

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