Voltage Fluctuation of Vacuum Arc Affected by Mixed Vapor from Oxide Layer

カテゴリ: 研究会(論文単位)

論文No: ED16083

グループ名: 【A】基礎・材料・共通部門 放電研究会

発行日: 2016/06/14

タイトル(英語): Voltage Fluctuation of Vacuum Arc Affected by Mixed Vapor from Oxide Layer

著者名: Arisa Takahashi(Tokyo City University),Keita Ogura(Tokyo City University),Shiko Kaneda(Tokyo City University),Shinji Yamamoto(Tokyo City University),Toru Iwao(Tokyo City University)

著者名(英語): Takahashi Arisa(Tokyo City University),Ogura Keita(Tokyo City University),Kaneda Shiko(Tokyo City University),Yamamoto Shinji(Tokyo City University),Iwao Toru(Tokyo City University)

キーワード: ｖａｃｕｕｍ　ａｒｃ　ｃａｔｈｏｄｅ　ｓｐｏｔ|ｖｏｌｔａｇｅ　ｆｌｕｃｔｕａｔｉｏｎ|ｏｘｉｄｅ　ｌａｙｅｒ|ＯＩ　ｓｐｅｃｔｒｕｍ|ＦｅＩＩ　ｓｐｅｃｔｒｕｍ|ｃｏｎｄｕｃｔｉｖｉｔｙ|vacuum arc cathode spot|voltage fluctuation|oxide layer|OI spectrum|FeII spectrum|conductivity

要約(日本語): Surface treatment is expected for promotion of circulating production. Vacuum arc technology is one of the dry processing which can remove an oxide layer and can form a surface roughness. Vacuum arc cathode spot moves very fast on the metal surface and evaporates the oxide layer. However, the voltage fluctuation of vacuum arc affected by mixed vapor remains unclear. As described herein, in order to know the influence of mixed vapor, the brightness of OI spectrum and FeII spectrum was measured. The experiments were performed using a SS400 cathode and a cylindrical copper anode. The cathode spot movement was recorded by a high-speed video camera. Then, the obtained images were analyzed by plasma image processing. As a result, the voltage fluctuation was caused by reaction rate of ionization of vapor which changes the conductivity.

要約(英語): Surface treatment is expected for promotion of circulating production. Vacuum arc technology is one of the dry processing which can remove an oxide layer and can form a surface roughness. Vacuum arc cathode spot moves very fast on the metal surface and evaporates the oxide layer. However, the voltage fluctuation of vacuum arc affected by mixed vapor remains unclear. As described herein, in order to know the influence of mixed vapor, the brightness of OI spectrum and FeII spectrum was measured. The experiments were performed using a SS400 cathode and a cylindrical copper anode. The cathode spot movement was recorded by a high-speed video camera. Then, the obtained images were analyzed by plasma image processing. As a result, the voltage fluctuation was caused by reaction rate of ionization of vapor which changes the conductivity.

原稿種別: 英語

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