Number of Vacuum Arc Cathode Spot Affected by Axial Magnetic Field

カテゴリ: 研究会(論文単位)

論文No: ED17076

グループ名: 【A】基礎・材料・共通部門 放電研究会

発行日: 2017/07/19

タイトル(英語): Number of Vacuum Arc Cathode Spot Affected by Axial Magnetic Field

著者名: Arisa Takahashi(Tokyo City University),Shiko Kaneda(Tokyo City University),Shinji Yamamoto(Tokyo City University),Toru Iwao(Tokyo City University)

著者名(英語): Takahashi Arisa(Tokyo City University),Kaneda Shiko(Tokyo City University),Yamamoto Shinji(Tokyo City University),Iwao Toru(Tokyo City University)

キーワード: ｖａｃｕｕｍ　ａｒｃ|ｃａｔｈｏｄｅ　ｓｐｏｔ|ａｘｉａｌ　ｍａｇｎｅｔｉｃ　ｆｉｅｌｄ|ｎｕｍｂｅｒ|ｅｖａｐｏｒａｔｉｏｎ　ｒａｔｅ|ｏｘｉｄｅ　ｌａｙｅｒ|vacuum arc|cathode spot|axial magnetic field|number|evaporation rate|oxide layer

要約(日本語): Surface treatment is expected for promotion of circulating production. Vacuum arc technology is one of the dry processing which can remove an oxide layer and can form a surface roughness. Vacuum arc cathode spot moves very fast on the metal surface and evaporates the oxide layer. However, the influence of applying an axial magnetic field to the cathode spot remains unclear. In order to know the removal process applying an axial magnetic field, the evaporation rate and the number of cathode spot was measured with changing the magnetic flux density. The experiments were performed using a copper cathode and a cylindrical copper anode. The cathode spot movement was recorded by a high-speed video camera. Then, the obtained images were analyzed by plasma image processing. From this processing, the evaporation rate and the number of cathode spot was calculated.

要約(英語): Surface treatment is expected for promotion of circulating production. Vacuum arc technology is one of the dry processing which can remove an oxide layer and can form a surface roughness. Vacuum arc cathode spot moves very fast on the metal surface and evaporates the oxide layer. However, the influence of applying an axial magnetic field to the cathode spot remains unclear. In order to know the removal process applying an axial magnetic field, the evaporation rate and the number of cathode spot was measured with changing the magnetic flux density. The experiments were performed using a copper cathode and a cylindrical copper anode. The cathode spot movement was recorded by a high-speed video camera. Then, the obtained images were analyzed by plasma image processing. From this processing, the evaporation rate and the number of cathode spot was calculated.

原稿種別: 英語

PDFファイルサイズ: 798 Kバイト