Decrement of Moving Speed of Vacuum Arc Cathode Spot by Distance between Cathode Spots

カテゴリ: 研究会(論文単位)

論文No: EPP19085

グループ名: 【A】基礎・材料・共通部門 放電・プラズマ・パルスパワー研究会

発行日: 2019/07/24

タイトル(英語): Decrement of Moving Speed of Vacuum Arc Cathode Spot by Distance between Cathode Spots

著者名: Takehide Kanashiro Tang(Tokyo City University),Masashi Shimazaki(Tokyo City Univercity),Yuriko Takeda(Tokyo City Univercity),Hiroki Kochi(Tokyo City Univercity),Yoshihumi Maeda(Tokyo City Univercity),Toru Iwao(Tokyo City Univercity)

著者名(英語): Kanashiro Tang Takehide(Tokyo City Univercity),Shimazaki Masashi(Tokyo City Univercity),Takeda Yuriko(Tokyo City Univercity),Kochi Hiroki(Tokyo City Univercity),Maeda Yoshihumi(Tokyo City Univercity),Iwao Toru(Tokyo City Univercity)

キーワード: Ａｒｃ　ｄｉｓｃｈａｒｇｅ|Ｃａｔｈｏｄｅ　ｓｐｏｔ|Ｏｘｉｄｅ　ｌａｙｅｒ　ｒｅｍｏｖａｌ|Ｉｍａｇｅ　ｐｒｏｃｅｓｓｉｎｇ|Ｐｌａｓｍａ|３Ｒ|Arc discharge|Cathode spot|Oxide layer removal|Image processing|Plasma|3R

要約(日本語): The surface treatment with a vacuum arc cathode spot is a technique in which a plurality of high temperature cathode spots are generated on a base material. The evaporation and removal are performed by moving the cathode spot. However, since the cathode spot moves irregularly, The oxide film is not removed, or the treated portion is treated again. Thus, an arbitrary surface roughness can not be obtained. As a method of controlling the movement of the cathode spot, it has been proposed to apply a magnetic field. By applying a magnetic field, it becomes straight-forward, but the cathode spot may split in the middle of the movement and change the movement direction and move. In this research, the distance of cathode spot, the electromagnetic force (between the cathode spots) and the moving direction are elucidated. As a result, it is obtained that the movement of the cathode spot is straight and slow as the distance between the cathode spots are wide.

要約(英語): The surface treatment with a vacuum arc cathode spot is a technique in which a plurality of high temperature cathode spots are generated on a base material. The evaporation and removal are performed by moving the cathode spot. However, since the cathode spot moves irregularly, The oxide film is not removed, or the treated portion is treated again. Thus, an arbitrary surface roughness can not be obtained. As a method of controlling the movement of the cathode spot, it has been proposed to apply a magnetic field. By applying a magnetic field, it becomes straight-forward, but the cathode spot may split in the middle of the movement and change the movement direction and move. In this research, the distance of cathode spot, the electromagnetic force (between the cathode spots) and the moving direction are elucidated. As a result, it is obtained that the movement of the cathode spot is straight and slow as the distance between the cathode spots are wide.

原稿種別: 英語

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