パルススパッタ放電のパワーカップリングシミュレーション

カテゴリ: 研究会(論文単位)

論文No: PST16085

グループ名: 【A】基礎・材料・共通部門 プラズマ研究会

発行日: 2016/10/20

タイトル(英語): A power coupling simulation of pulsed-sputtering discharges

著者名: 行村 建(西南交通大学)

著者名(英語): Ken Yukimura(Southwest Jiaotong University)

キーワード: ＨｉＰＩＭＳ|ペニング放電|モデリング|グロー放電|反応速度定数|HiPIMS|Penning Discharge|modeling|glow discharge|reaction rate

要約(日本語): パルスグロー放電（MSおよびペニング放電）について消費電力をベースとしたプラズマモデリングを構築し、解析を行った。

要約(英語): The power coupling simulation for high-power pulsed plasmas in which electrons are confined by an magnetic field was carried out. The pulsed plasma is featured that its characteristics are temporally changed during the plasma generation. When the plasma is accompanied by sputtering of the target material, metal species as well as gas species simultaneously appear in the plasma. Chemical reactions occurring in the plasma were equated by combining with the power consumed in the plasma. No rarefaction of the heated gas and the reflection of energetic gas species at the target were not considered due to comparatively short-pulsed plasma, where HiPIMS (high-power impulse magnetron sputtering) and a pulsed Penning glow were treated. Both plasmas were on the order of 100 kW-level instantaneous power.

原稿種別: 日本語

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