窒素イオン照射を用いたPTFEの接着力向上―接着力向上に寄与する架橋層の形成深さ―
窒素イオン照射を用いたPTFEの接着力向上―接着力向上に寄与する架橋層の形成深さ―
カテゴリ: 論文誌(論文単位)
グループ名: 【A】基礎・材料・共通部門
発行日: 2012/03/01
タイトル(英語): Improvement in Adhesive Strength of PTFE using Nitrogen Ion Irradiation―Contribution of Formation Depth of Cross-linking Layer on Adhesive Strength―
著者名: 渡辺 剛志(東京都市大学),岩尾 徹(東京都市大学),湯本 雅恵(東京都市大学)
著者名(英語): Tsuyoshi Watanabe (Tokyo City University), Toru Iwao (Tokyo City University), Motoshige Yumoto (Tokyo City University)
キーワード: PTFE,イオン照射,イオンエネルギー,接着力,極性基,架橋構造 PTFE,ion irradiation,ion energy,adhesive strength,polar groups,cross-linking structure
要約(英語): The adhesive strength doesn't improve so much even if the surface is activated. It is known that PTFE (polytetra fluoroethylene) is one of the collapse type polymer since the binding energy of main chain is smaller than that of side chain. Accordingly, it is assumed that adhesive strength may improve by suppressing the collapse of structure. It is also expected that introduction of cross-linking structure may suppress the collapse of structure. It was confirmed that a lot of polar radicals were introduced at the surface by nitrogen ion irradiation around 30 eV. Thus, to introduce the cross-linking structure several 100 eV nitrogen ions were irradiated after irradiation of nitrogen with 30 eV ion. As a result, adhesive strength irradiated by 300 eV improved more than that of 1000 eV. From the result of XPS (X-ray-Photoelectron-Spectroscopy) analysis, many C-N-C bonds contributing cross-linking structure was detected at a shallow layer by irradiation of ions with 300 eV. From these results, it is concluded that the depth of cross-link formation is important to improve the adhesive strength.
本誌: 電気学会論文誌A(基礎・材料・共通部門誌) Vol.132 No.3 (2012) 特集:平成23 年基礎・材料・共通部門大会
本誌掲載ページ: 245-250 p
原稿種別: 論文/日本語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/132/3/132_3_245/_article/-char/ja/
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