同軸型プラズマガンによる成膜装置の開発と評価

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2014/09/01

タイトル(英語): Development and Evaluation of Deposition System by Utilizing a Coaxial Plasma Gun

著者名: 高津　幹夫（日本大学理工学部物理学科），浅井　朋彦（日本大学理工学部物理学科），平塚　傑工（ナノテック（株） R&Pセクター）

著者名(英語): Mikio Takatsu (Department of Physics, College of Science and Technology, Nihon University), Tomohiko Asai (Department of Physics, College of Science and Technology, Nihon University), Masanori Hiratsuka (R&P Sector, NANOTEC Corporation)

キーワード: 物理気相成長法，電磁加速，繰り返しパルス放電　　physical vapor deposition，electromagnetic acceleration，repetitively pulsed discharge

要約(英語): A magnetized coaxial plasma gun (MCPG) has been studied in the context of nuclear fusion research, for particle and magnetic helicity injection and spheromak formation through electromagnetically accelerated magnetized plasmoid. On the other hand, most of physical vapor deposition (PVD) techniques have been developed for surface modification and new substance composition in field of electric-appliance, material, semiconductor, etc. However, in the conventional methods, conditions of deposition are limited by productive efficiency and thermal load to the substrate. We proposed a novel PVD method by utilizing electromagnetic acceleration of MCPG. In this study, we deposited Al films on SiO2 by the method, and evaluated the deposition rate and the adhesion strength. We confirmed the adhesion strength of about 2.1 times higher than the conventional method. This method can deposit a thin film with high adhesion strength by electromagnetically accelerating particles.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.134 No.9 （2014） 特集：高ベータコンパクトトーラスプラズマの先進制御

本誌掲載ページ: 503-508 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/134/9/134_503/_article/-char/ja/