EUVレジストの高感度化の検討

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2017/05/01

タイトル(英語): The Study of the Sensitizing of EUV Resist

著者名: 関口　淳（リソテックジャパン（株））

著者名(英語): Atushi Sekiguchi (Litho Tech Japan Corp.)

キーワード: EUVリソグラフィー，ナノパーティクル，EUVメタルレジスト，シンクロトロン　　EUV lithography，nano-particle，EUV metal resist，synchrotron

要約(英語): Studies have been carried out on developing a method for improving EUV resist sensitivity by enhancing EUV light absorption through the addition of metals having high EUV light absorption to the resist polymer in order to increase secondary electron emission, thereby enhancing PAG reactivity and improving acid generation efficiency(1)-(3). To confirm whether the addition of metals having high EUV light absorption actually does enhance sensitivity, study efforts included transmittance measurements and sensitivity evaluations of resist samples doped with ZrO2 or TeO2 nanoparticles, which have low and high EUV light absorption, respectively, in molar quantities of 0-2 relative to PAG. The samples were subjected to EUV exposure at the NewSUBARU synchrotron radiation facility. While the ZrO2-doped resist showed no evident enhancement of sensitivity or transmittance, the TeO2-doped resist showed enhancement in both properties. Based on these results, we confirmed that the addition of metals having high EUV light absorption to the EUV resist enhances its EUV light absorption and increases secondary electron emission, thereby enhancing PAG reactivity and improving acid generation efficiency.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.137 No.5 （2017） 特集：革新的な光応用技術

本誌掲載ページ: 242-245 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/137/5/137_242/_article/-char/ja/