Superior Patterning Characteristics of Simple Projection Exposure Tool Developed for Printing Flow Path Patterns in Thick Resist Films

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2017/05/01

タイトル(英語): Superior Patterning Characteristics of Simple Projection Exposure Tool Developed for Printing Flow Path Patterns in Thick Resist Films

著者名: Toshiyuki Horiuchi (Tokyo Denki University), Yuta Morizane (Tokyo Denki University)

著者名(英語): Toshiyuki Horiuchi (Tokyo Denki University), Yuta Morizane (Tokyo Denki University)

キーワード: thick resist，large pattern，defocused exposure，vertical side walls，flow-path patterns，micro-mixer

要約(英語): A simple and low-cost projection exposure system was developed for printing large patterns with widths of 50-100 μm in thick resist films with a thickness of 100 μm. As a projection lens, a commercially available camera lens was used. The projection ratio was set to 1.0, and the calculated numerical aperture (NA) was 0.089. By setting the NA to such low value, a large depth of focus was guaranteed. In addition, side walls of resist patterns were controlled almost vertical by printing patterns under the largely defocused conditions. Using the exposure system and the above mentioned defocused exposure, flow path patterns with vertical side walls were precisely fabricated. It was demonstrated that the micro-mixers with the resist flow paths were successfully usable without leaks. It was discussed finally why such patterns with vertical side walls were desirably obtained.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.137 No.5 （2017） 特集：革新的な光応用技術

本誌掲載ページ: 253-259 p

原稿種別: 論文／英語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/137/5/137_253/_article/-char/ja/