プラズマフォーカスにおける高強度パルスビームを利用したDLC薄膜生成

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2017/10/01

タイトル(英語): Deposition of DLC Films using Intense Pulsed Beam in Plasma Focus Device

著者名: 伊藤　弘昭（富山大学大学院理工学研究部），中田　洋平，王　植平

著者名(英語): Hiroaki Ito （Graduate School of Science and Engineering, University of Toyama）, Youhei Nakata, Zhiping Wang

キーワード: プラズマフォーカス装置，ダイヤモンドライクカーボン，パルス荷電粒子ビーム，アブレーションプラズマ　　plasma focus device，diamond like carbon，pulsed charged particle beam，ablation plasma

要約(英語): Diamond like carbon (DLC) films were deposited on the silicon substrate using the dense plasm focus (DPF) device. The intense pulsed ion and electron beams, emitted from the DPF device with hydrogen as filling gas at 300 Pa, have been used to ablate the graphite target depositing DLC films. The deposited samples were analyzed for their hardness, structure and chemical composition by nano-indenter, X-ray diffraction and Raman spectroscopy, respectively. Raman studies verified the formation of DLC films with D and G peaks. Raman spectra indicated that samples deposited by the electron beam ablation possessed higher sp3 content. Studies of film plastic hardness with a nano-indenter found that the DLC films deposited by the electron beam ablation have three times higher mechanical hardness than those by the ion beam ablation. Hardness results were in good agreement with Raman results.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.137 No.10 （2017）

本誌掲載ページ: 559-563 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/137/10/137_559/_article/-char/ja/