エチレンプラズマによるアモルファス炭素膜堆積の堆積過程の赤外分光解析

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2018/11/01

タイトル(英語): IR Absorption Spectroscopy of Deposition Process of Amorphous Carbon Film due to Ethylene Plasma

著者名: 篠原　正典（佐世保工業高等専門学校），冨永　泰佑（佐世保工業高等専門学校），下村　勇登（佐世保工業高等専門学校），猪原　武士（佐世保工業高等専門学校），柳生　義人（佐世保工業高等専門学校），大島　多美子（佐世保工業高等専門学校），川崎　仁晴（佐世保工業高等専門学校）

著者名(英語): Masanori Shinohara (National Institute of Technology, Sasebo College), Taisuke Tominaga (National Institute of Technology, Sasebo College), Hayato Shimomura (National Institute of Technology, Sasebo College), Takeshi Ihara (National Institute of Technolog

キーワード: 多重内部反射，赤外吸収分光，プラズマ中，堆積化過程　　multiple-internal-reflection，infrared absorption spectroscopy，during plasma，deposition process

要約(英語): Changes in chemical states of amorphous carbon film during ethylene (C2H4) plasma in the floating potential were investigated with multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS) and deposition rates. IRAS spectra showed the peaks due to the sp3-CHX were observed, but no peaks due to sp2-CHX were observed. The deposition rate due to ethylene plasma were nearly twice as much as that due to methane plasma, in the same way that the number of carbons in an ethylene molecule is twice as that in a methane molecule. It is suggested that the film growth due to ethylene plasma is the same manner of that due to methane plasma; the plasma-generated hydrocarbon species such as C2H3, C2H5, which are generated in ethylene plasma are adsorbed on dangling bonds which are generated by hydrogen abstraction from the deposited film surface. As a result, the deposited film is comprised of sp3-hydrocarbon components.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.138 No.11 （2018） 特集：各種プラズマ計測法の進展とその応用

本誌掲載ページ: 544-550 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/138/11/138_544/_article/-char/ja/