MOD法により作製したTiO2分散型VOx薄膜の特性評価

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2019/12/01

タイトル(英語): Evaluation of TiO2-dispersed VOx Thin Films Fabricated by MOD

著者名: Van Nhu　Hai（防衛大学校 電気電子工学科），河原　正美（（株）高純度化学研究所），佐村　剛（（株）高純度化学研究所），立木　隆（防衛大学校 電気電子工学科），内田　貴司（防衛大学校 電気電子工学科）

著者名(英語): Van Nhu Hai (National Defense Academy), Masami Kawahara (Kojundo Chemical Laboratory Co., Ltd.), Tsuyoshi Samura (Kojundo Chemical Laboratory Co., Ltd.), Takashi Tachiki (National Defense Academy), Takashi Uchida (National Defense Academy)

キーワード: 有機金属分解 (MOD) 法，酸化バナジウム (VOx)，酸化チタン (TiO2)，ナノ粒子　　metal-organic decomposition (MOD)，vanadium oxide (VOx)，titanium oxide (TiO2)，nanoparticles

要約(英語): TiO2-V2O5 precursor films with a variety of molar ratio of Ti to V (xm = 0～35%) were fabricated by metal-organic decomposition (MOD). These precursor films were fired in O2 atmosphere. It was found that TiO2 nanoparticles coexisted with V2O5 from the measurement of XRD and SEM, and that the obtained films were TiO2-dispersed V2O5 films. Precipitates of TiO2 were observed on the surfaces of the films for xm higher than 10%. Atomic ratio of Ti (xa) dissolved in V2O5 grains as TiO2 nanoparticles increased with increasing xm and saturated in a range of xa = 12-13%. For the films fabricated with xm higher than 10%, TiO2 precipitated on and/or between the grains. Then, these films were thermally reduced by a heat treatment under a pressure of 1.2 Pa (air). The R-T characteristics of the films indicated the phase transition due to a VO2(M) phase. The resistance change and the hysteresis loop width decreased with increasing xm and the suppressed R-T characteristics were obtained.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.139 No.12 （2019） 特集：電磁環境評価技術に関する論文

本誌掲載ページ: 708-714 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/139/12/139_708/_article/-char/ja/