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酸化膜の厚さが及ぼす真空アーク陰極点の移動形態への寄与

酸化膜の厚さが及ぼす真空アーク陰極点の移動形態への寄与

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カテゴリ: 論文誌(論文単位)

グループ名: 【B】電力・エネルギー部門

発行日: 2015/05/01

タイトル(英語): Contribution to Moving Mode of Vacuum Arc Cathode Spot Affected by Oxide Layer Thickness

著者名: 山本 真司(東京都市大学工学部電気電子工学科),岩尾 徹(東京都市大学工学部電気電子工学科),湯本 雅恵(東京都市大学工学部電気電子工学科)

著者名(英語): Shinji Yamamoto (Department of Electrical and Electronic Engineering, Tokyo City University), Toru Iwao (Department of Electrical and Electronic Engineering, Tokyo City University), Motoshige Yumoto (Department of Electrical and Electronic Engineering, Tokyo City University)

キーワード: 表面処理,金属蒸気,画像処理,体積除去速度,移動速度  surface treatment,metal vapor,image processing,removal volume speed,moving speed

要約(英語): A remarkable characteristic of a vacuum arc cathode spot, which can remove an oxide layer, is that it moves across the metal surface. However, the contribution to the moving mode of the vacuum arc cathode spot remains unclear. This study elucidated the contribution to moving mode of the vacuum arc cathode spot as affected by the oxide layer thickness. Experiments were conducted using an SS400 cathode and a cylindrical copper anode. A high-speed video camera recorded the cathode spot movement with ND (Neutral Density) and a band pass filter. The obtained images were then analyzed using plasma image processing. The cathode spots have four moving modes: oxide layer removal, split, stagnation at the boundary between the oxide layer and the processed surface, and high-speed movement on the processed surface. Oxide layer thickness affects the cathode spot moving mode because of the maintenance of the current continuity of the cathode spot with oxide layer vaporization and ionization. Oxide layer thickness affects the cathode spot movement.

本誌: 電気学会論文誌B(電力・エネルギー部門誌) Vol.135 No.5 (2015)

本誌掲載ページ: 338-344 p

原稿種別: 論文/日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejpes/135/5/135_338/_article/-char/ja/

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