化学的手法によるエポキシ樹脂薄膜の作製
化学的手法によるエポキシ樹脂薄膜の作製
カテゴリ: 論文誌(論文単位)
グループ名: 【C】電子・情報・システム部門
発行日: 2011/11/01
タイトル(英語): Preparation of Epoxy Resin Thin Film by Electroless Deposition Method
著者名: 福井 斉(奈良工業高等専門学校),平井 誠(奈良工業高等専門学校),品川 勉(大阪市立工業研究所),小林 靖之(大阪市立工業研究所),千金 正也(大阪市立工業研究所),藤原 裕(大阪市立工業研究所),藤田 直幸(奈良工業高等専門学校)
著者名(英語): Hitoshi Fukui (Nara National college of Technology), Makoto Hirai (Nara National college of Technology), Tsutomu Shinagawa (Osaka Municipal Technical Research Institute), Yasuyuki Kobayashi (Osaka Municipal Technical Research Institute), Masaya Chigane (Osaka Municipal Technical Research Institute), Yutaka Fujiwara (Osaka Municipal Technical Research Institute), Naoyuki Fujita (Nara National college of Technology)
キーワード: 無電解成膜,エポキシ樹脂薄膜,電着塗装反応 electroless deposition,epoxy resin thin film,electrodeposition reaction
要約(英語): The electrodeposition coating process, which is a polymer film deposition method using water electrolysis, is widely used for automobile body primers. Recently this process is being used in the insulating polymer films deposition for the microelectromechanical system (MEMS) or micro electric components. However, this process has difficulty in depositing polymer film on complex shapes and non-conductive surfaces. In this paper, we demonstrate that epoxy resin thin films used extensively as insulating polymer films were successfully deposited using the electroless chemical reaction in aqueous solution on a non-conductive surface and high aspect glass tube. The substrates catalyzed using a commercialized three-step Sn/Ag/Pd activation process were immersed in the reaction solution containing water-soluble resin and NO3- ion, reducing agent (DMAB). The pH near the substrate rose when NO3? was reduced by released electrons from DMAB. Water-soluble resin combined with OH?; hence, polymer thin film was deposited by the electroless deposition reaction. By FE-SEM and FT-IR measurement, it was clear that the conformal and dense epoxy resin films were deposited. Using the present method, epoxy films could be deposited on the surface of a high aspect ratio glass tube 50 mm in length and φ3 in inner diameter. These films had high insulation resistivity of 10 8 ~10 11Ωm with applied voltage of 250 V.
本誌: 電気学会論文誌C(電子・情報・システム部門誌) Vol.131 No.11 (2011) 特集:電気関係学会関西連合大会
本誌掲載ページ: 1843-1847 p
原稿種別: 論文/日本語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejeiss/131/11/131_11_1843/_article/-char/ja/
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