フッ素レーザによる表面改質とその最先端応用

カテゴリ: 論文誌(論文単位)

グループ名: 【C】電子・情報・システム部門

発行日: 2013/03/01

タイトル(英語): Fluorine Laser Induced Surface Modification and Its Advanced Application

著者名: 大越　昌幸（防衛大学校 電気情報学群電気電子工学科），井上　成美（防衛大学校 電気情報学群電気電子工学科）

著者名(英語): Masayuki Okoshi (Department of Electrical and Electronic Engineering, National Defense Academy), Narumi Inoue (Department of Electrical and Electronic Engineering, National Defense Academy)

キーワード: フッ素レーザ，表面改質，シリコーン，シリカガラス，ポリカーボネート，シリカガラス代替軽量窓材　　fluorine laser，surface modification，silicone，silica glass，polycarbonate，lightweight automobile window

要約(英語): A transparent, hard silica glass (SiO2) layer was formed on a conventional protective coat made of silicone ([SiO(CH3)2]n) on a polycarbonate plate by the 157nm F2 laser-induced photochemical modification of silicone into SiO2. An optimum laser irradiation time of the F2 laser was found to form a crack-free SiO2 layer. The high optical transparency of the samples in the visible light region remained unchanged after the F2 laser irradiation. In the Taber abrasion test, the SiO2 layer markedly reduced the number of scratches, resulting in a low haze value. The haze values of the samples also depend on the thickness of the silicone protective coat underneath the SiO2 protective layer. As a result, the difference of haze value was successfully reduced to 1.2%, compared with these of the nonirradiated sample and a bare polycarbonate plate of approximately 3.5 and 46%, respectively, which is comparable to the case of a bare silica glass of approximately 0.9%. In addition, the thickness of the SiO2 protective layer was estimated to be approximately 0.44μm for the 30-s laser irradiation by immersing the samples in 1 wt % hydrogen fluoride aqueous solution and measuring the depth using a surface profilometer.

本誌: 電気学会論文誌C（電子・情報・システム部門誌） Vol.133 No.3 （2013） 特集Ⅰ：電磁波の技術と科学および信号処理　特集Ⅱ：電子・情報・システム分野の最先端技術

本誌掲載ページ: 490-493 p

原稿種別: 解説／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejeiss/133/3/133_490/_article/-char/ja/