高速多点計測を実現する測長SEM撮像シーケンス最適化

カテゴリ: 論文誌(論文単位)

グループ名: 【C】電子・情報・システム部門

発行日: 2017/10/01

タイトル(英語): Optimization of CD-SEM Imaging Sequence to Achieve High-speed and Multi-point Measurement

著者名: 宮本　敦（（株）日立製作所 研究開発グループ），川原　敏一（（株）日立ハイテクノロジーズ）

著者名(英語): Atsushi Miyamoto (Research & Development Group, Hitachi, Ltd.), Toshikazu Kawahara (Hitachi High-Technologies Corporation)

キーワード: 測長SEM，撮像シーケンス，設計データ，MLA法，高スループット　　CD-SEM，imaging sequence，design data，multifactor layout analysis method，high throughput

要約(英語): Critical dimension scanning electron microscope (CD-SEM) is widely used as an essential tool for measuring semiconductor patterns. It is necessary to set imaging sequence including corrections of imaging position and focusing of electron beam in evaluation point (EP) for the reliable measurement. Previously, addressing point (AP) and autofocus point (AF) suitable for these processing are selected by the hand and this is a drop factor of SEM operation rates. In our previous work, we developed a multifactor layout analysis (MLA) method, which automatically generate imaging sequence for each EP from design data of the pattern layout. In this paper, we propose an enhanced MLA method, which optimizes the imaging sequence to share AP and AF between multiple EPs. For 203 EPs, the imaging time of the proposed method is twice as fast as that of conventional MLA method. Without the hard improvement of the SEM apparatus, the proposed method can realize significant throughput improvement for numerous EPs

本誌: 電気学会論文誌C（電子・情報・システム部門誌） Vol.137 No.10 （2017）

本誌掲載ページ: 1379-1386 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejeiss/137/10/137_1379/_article/-char/ja/