光電極高機能化に向けた光MOD法への酸素プラズマ融合効果

カテゴリ: 論文誌(論文単位)

グループ名: 【C】電子・情報・システム部門

発行日: 2019/03/01

タイトル(英語): Integration Effect of O2-Plasma to an Excimer-Laser assisted Metal Organic Deposition Process for Functionalization of Photoelectrodes

著者名: 西川　雅美（長岡技術科学大学），瀬川　龍生（長岡技術科学大学），齊藤　信雄（長岡技術科学大学），石橋　隆幸（長岡技術科学大学），中島　智彦（産業技術総合研究所），土屋　哲男（産業技術総合研究所）

著者名(英語): Masami Nishikawa (Nagaoka University of Technology), Ryusei Segawa (Nagaoka University of Technology), Nobuo Saito (Nagaoka University of Technology), Takayuki Ishibashi (Nagaoka University of Technology), Tomohiko Nakajima (National Institute of Advanced Industrial Sceience and Technology), Tetsuo Tsuchiya (National Institute of Advanced Industrial Sceience and Technology)

キーワード: エキシマレーザ，MOD，酸素プラズマ，TiO2，Cu2O　　Excimer laser，MOD，O2-plasma，TiO2，Cu2O

要約(英語): To prevent photocorrosion of a Cu2O photocathode, composition of a TiO2 layer onto the Cu2O is one of the most effective solutions. For crystallization of the TiO2 layer alone without heat-damage to the underlying Cu2O layer which is easy to oxidize to CuO, we developed the integration process of O2-plasma and an excimer-laser irradiation, that a metal-organic precursor film is crystalized by irradiation of the excimer-laser in O2-plasma. The TiO2 layer could be crystalized with lower oxygen vacancies by the laser irradiation in O2-plasma compared to that prepared by the irradiation in air. Furthermore, the oxidation of Cu2O to CuO was drastically restricted due to the highly crystalized TiO2 in which oxygen ions were hard to diffuse to the interface of TiO2/Cu2O. The photocorrosion of the obtained film during water reduction reaction was also restricted. This O2-plasma integrated process is effective for selective crystallization of metal-oxide films for functionalization of photoelectrodes.

本誌: 電気学会論文誌C（電子・情報・システム部門誌） Vol.139 No.3 （2019） 特集：フレキシブルセラミックスコーティング

本誌掲載ページ: 197-202 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejeiss/139/3/139_197/_article/-char/ja/