アドレッシング注目領域の最適化を含む測長SEM撮像シーケンス自動生成

カテゴリ: 論文誌(論文単位)

グループ名: 【C】電子・情報・システム部門

発行日: 2019/08/01

タイトル(英語): Automatic Generation of CD-SEM Imaging Sequence Including Optimization of Addressing Region of Interest

著者名: 宮本　敦（（株）日立製作所 研究開発グループ），川原　敏一（（株）日立ハイテクノロジーズ）

著者名(英語): Atsushi Miyamoto (Hitachi, Ltd., Research & Development Group), Toshikazu Kawahara (Hitachi High-Technologies Corporation)

キーワード: 測長SEM，アドレッシング，設計データ，MLA法，ROI　　CD-SEM，addressing，design data，multifactor layout analysis method，region of interest

要約(英語): Critical dimension scanning electron microscope (CD-SEM) is widely used as an essential tool for measuring semiconductor patterns formed on a silicon wafer. For achieving a reliable measurement, CD-SEM requires to set up imaging sequence including correction of imaging position. The imaging region including unique patterns is selected manually as addressing point (AP) and positional error can be detected by a design-SEM matching at AP. In our previous work, we developed a multifactor layout analysis (MLA) method, which automatically selects AP position from design layout data of semiconductor patterns. In this paper, we propose an enhanced MLA method, which simultaneously optimizes position and size of the matching region of interest (ROI). For 100 evaluation points, the proposed method optimized the ROI region, which led to 51.3% reduction in addressing time compared to the conventional MLA method.

本誌: 電気学会論文誌C（電子・情報・システム部門誌） Vol.139 No.8 （2019） 特集：データ駆動制御 ―モデルベースド制御とのインタープレイ―

本誌掲載ページ: 927-935 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejeiss/139/8/139_927/_article/-char/ja/