細いフレームを持つ焦点可変ミラーの SOI ウエハ残留応力による変形

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2011/08/01

タイトル(英語): Deformation of Varifocal Mirror with Narrow Frame by SOI Wafer Residual Stress

著者名: 佐々木 敬（東北大学大学院工学研究科），羽根 一博（東北大学大学院工学研究科）

著者名(英語): Takashi Sasaki (Graduate School of Engineering, Tohoku University), Kazuhiro Hane (Graduate School of Engineering, Tohoku University)

キーワード: SOI ウエハ，可変ミラー，ミラー支持フレーム，表面形状　　SOI wafer，varifocal mirror，mirror supporting frame，surface profile

要約(英語): Silicon-on-insulator (SOI) wafers are used for many micro-electro-mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.131 No.8 （2011） 特集：先進自動車を支えるセンシング技術

本誌掲載ページ: 310-315 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/131/8/131_8_310/_article/-char/ja/