Photolithography for Minimal Fab System

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2013/09/01

タイトル(英語): Photolithography for Minimal Fab System

著者名: Sommawan Khumpuang (Nanoelectronics Research Institute, AIST), Hitoshi Maekawa (Nanoelectronics Research Institute, AIST), Shiro Hara (Nanoelectronics Research Institute, AIST)

著者名(英語): Sommawan Khumpuang (Nanoelectronics Research Institute, AIST), Hitoshi Maekawa (Nanoelectronics Research Institute, AIST), Shiro Hara (Nanoelectronics Research Institute, AIST)

キーワード: Minimal Fab System，clean room free，photolithography，edge bead removal

要約(英語): Minimal Fab System Photolithography has been developed for wafer patterning process without the requirement of a cleanroom. It consists of minimal resist coater, minimal maskless UV exposure, minimal mask aligner and minimal resist developer. We have proved in practice that the spin coating using minimal resist coater for a 0.5-inch wafer gives the identical result of resist thickness compared with 4-inch wafers without changes to a higher rotational speed. The minimal maskless UV exposure using Digital Light Processing (DLP) confirms that only one LED light source with the light intensity of 150 mW/cm2 can expose over a 0.5-inch wafer in a few minutes. The minimal mask aligner is developed for a high speed exposure within 5-20 seconds. The aligner also uses a LED light source that can produce the light intensity of 14 mW/cm2. The present photoresist resolution for the maskless UV exposure and the mask aligner are 1 μm and 2 μm, respectively. The minimal developer has minimized its consumption of developing agents. Due to the surface tension, a volume of developing agent is kept on the wafer surface for slowly spinning to stimulate the developing process. The developing time is 20% saved from that of the conventional puddle development.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.133 No.9 （2013） 特集：マイクロエネルギーハーベスティング

本誌掲載ページ: 272-277 p

原稿種別: 論文／英語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/133/9/133_272/_article/-char/ja/