イオン照射とスパッタリングの同時プロセスを利用したTiNi合金薄膜の低温合成技術の開発

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2013/10/01

タイトル(英語): Development of Low-Temperature Crystallization Process for TiNi Alloy Film by Sputtering Deposition Simultaneously with Ion Irradiation

著者名: 池永　訓昭（金沢工業大学 ものづくり研究所），作道　訓之（金沢工業大学 工学部）

著者名(英語): Noriaki Ikenaga (Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology), Noriyuki Sakudo (College of Engineering, Kanazawa Institute of Technology)

キーワード: TiNi形状記憶合金，プラズマイオン注入成膜，低温結晶化，イオン照射　　TiNi shape memory alloy，Plasma based ion implantation and deposition，low-temperature crystallization，ion irradiation

要約(英語): Sputter-deposited TiNi films had needed for a long time a post-annealing process (about 500℃) in order to have properties for shape memory alloy (SMA). A new deposition process, which incorporated simultaneous ion irradiation with multi-target RF magnetron sputtering, enabled to form crystalline TiNi films directly on a substrate at a temperature lower than 200℃. We have reported in our previous study that an SMA device was successfully fabricated on polyimide substrate without any thermal annealing. In this paper, we reveal how the energy of irradiating ion affects on lowering the optimum crystallization temperature of films. As a result, the threshold of ion energy at which crystallization comes out changes depending on plasma conditions, if the energy of irradiating ion determined only by the pulse bias voltage. However, when the energy of irradiating ion is corrected by adding the plasma potential to the bias voltage, it becomes almost constant.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.133 No.10 （2013） 特集：エネルギーの創出・活用に関わるセンシング

本誌掲載ページ: B297-B300 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/133/10/133_297/_article/-char/ja/