2D Asymmetric Silicon Micro-Mirrors for Electrostatic Field Distribution Measurement Using Optical Level Method

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2015/08/01

タイトル(英語): 2D Asymmetric Silicon Micro-Mirrors for Electrostatic Field Distribution Measurement Using Optical Level Method

著者名: Takaki Itoh (Industrial Technology Center of Wakayama Prefecture), Toshihide Kuriyama (Kinki University), Toshiyuki Nakaie (Hanwa Electronic Ind. Co., Ltd.), Jun Matsui (Hanwa Electronic Ind. Co., Ltd.), Yoshiaki Miyamoto (Hanwa Electronic Ind. Co., Ltd.)

著者名(英語): Takaki Itoh (Industrial Technology Center of Wakayama Prefecture), Toshihide Kuriyama (Kinki University), Toshiyuki Nakaie (Hanwa Electronic Ind. Co., Ltd.), Jun Matsui (Hanwa Electronic Ind. Co., Ltd.), Yoshiaki Miyamoto (Hanwa Electronic Ind. Co., Ltd.)

キーワード: 2D asymmetric silicon micro-mirror，SOI-MEMS，vacuum sealing package，electrostatic field distribution measurement

要約(英語): We developed silicon micro-mirrors with two asymmetric axes for electrostatic field distribution measurements using a single external piezoelectric ceramic vibrating element. The 2D asymmetric silicon micro-mirrors were fabricated by using an SOI-MEMS process. The vibration transmissibility of the proposed mirror under a vacuum atmosphere was evaluated by dynamic analysis. We obtained the resonant frequency in the low-speed axis of 23.3 Hz and in the high-speed axis of 556.8 Hz respectively. To prevent a reduction in the amplitude width, we induced a 90° phase shift between the low- and high-speed axes at the resonance frequency. The ratio of the deformation between the low-speed axis of 30 Hz and the high-speed axis of 604 Hz was simulated to be 4.04. In measurement, the ratio of the deformation between the low-speed axis of 23.3 Hz and the high-speed axis of 556.8 Hz was 6.48. The difference between the calculated and experiment values were apparently due to the fabrication errors and frequency characteristics of piezoelectric ceramic vibrating element. A Lissajous pattern projected onto the screen. The scanning angle was a degree of 7.6 (total angle) in the low- and high-speed axis. We subsequently measured the electrostatic field distribution using the 2D asymmetric silicon micro-mirrors by means of the optical level method.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.135 No.8 （2015） 特集：ケミカルセンサの基礎

本誌掲載ページ: 311-316 p

原稿種別: 論文／英語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/135/8/135_311/_article/-char/ja/