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Liquid Immersion Angled Exposure for 3D Photolithography

Liquid Immersion Angled Exposure for 3D Photolithography

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カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2016/03/01

タイトル(英語): Liquid Immersion Angled Exposure for 3D Photolithography

著者名: Takafumi Hosono (Department of Advanced Science and Technology, Toyota Technological Institute), Shinya Kumagai (Department of Advanced Science and Technology, Toyota Technological Institute), Minoru Sasaki (Department of Advanced Science and Technology,

著者名(英語): Takafumi Hosono (Department of Advanced Science and Technology, Toyota Technological Institute), Shinya Kumagai (Department of Advanced Science and Technology, Toyota Technological Institute), Minoru Sasaki (Department of Advanced Science and Technology, Toyota Technological Institute)

キーワード: 3D photolithography,Vertical side wall,Angled exposure,Liquid immersion

要約(英語): Photolithography on a sample surface with vertical side walls is studied. In the angled exposure for patterning side walls and bottoms, the reflection of the exposing light causes superimposition of the pattern. The reflection should therefore be minimized to obtain a defect-free pattern. The liquid immersion method is applied. With polarization control, an optimum pattern is obtained using single shot exposure.

本誌: 電気学会論文誌E(センサ・マイクロマシン部門誌) Vol.136 No.3 (2016) 特集:センサ・マイクロマシン英文特集号

本誌掲載ページ: 90-91 p

原稿種別: 研究開発レター/英語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/136/3/136_90/_article/-char/ja/

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