FePdスパッタ磁歪膜への熱処理効果のMEMSカンチレバーを用いた評価

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2016/09/01

タイトル(英語): Evaluation of Annealing Effect on Sputtered FePd Magnetostrictive Film using MEMS Cantilever

著者名: 笹渕　貴史(山形大学大学院理工学研究科),岡田　尚樹(山形大学工学部),佐藤　翼(山形大学工学部),小池　邦博(山形大学大学院理工学研究科),峯田　貴(山形大学大学院理工学研究科)

著者名(英語): Takashi Sasabuchi (Yamagata Univ. Graduate school of Science and Engineering), Naoki Okada (Yamagata Univ. Faculty of Engineering), Tsubasa Satoh (Yamagata Univ. Faculty of Engineering), Kunihiro Koike (Yamagata Univ. Graduate school of Science and Engineering), Takashi Mineta (Yamagata Univ. Graduate school of Science and Engineering)

キーワード: MEMSカンチレバー,Si,FePd,磁歪膜,熱処理,結晶構造　　MEMS cantilever,Si,FePd,Magnetostrictive film,Annealing,Crystal structure

要約(英語): Effect of annealing on magnetostriction of sputtered Fe60Pd40 film was evaluated using MEMS cantilevers with multi-layer structure of FePd (2 μm) / SiO2 (0.1 μm) / Si (50 μm). Magnetostrictive effect, which was about 45 ppm before annealing, increased 1.5-3 times after annealing at 350-450℃ for 30 min. In contrast, magnetostriction along the cantilever was lost when annealing at 500℃. The FePd film surface was highly oriented to fct <111)> and fcc <111> planes. In addition to the <111> orientation, in-plane crystal phase was oriented to fct <220> and fcc <220> planes. After annealing, surface orientated fct <111> plane increased with icreaseing annealing temperature, in spite of the magnetostoriction loss at 500℃, indicating that the fct <111> orientation has no effect on magnetostriction. In-plane fct <220> plane crystallization advanced by 400℃ annealing, and the orientation to fct <220> decreased by 500℃annealing, which were same tendency of the increase and decrease of the magnetstriction.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.136 No.9 （2016） 特集：マイクロ・ナノ医療デバイス

本誌掲載ページ: 408-412 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/136/9/136_408/_article/-char/ja/