還元基修飾インターカレータを用いた2本鎖DNAの特異的金属被覆

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2016/10/01

タイトル(英語): Specific Metallization of Double-Stranded DNA Using Reducing Group-Labeled Intercalator

著者名: 氷室　貴大（九州工業大学 大学院生命体工学研究科），荒木　遼（九州工業大学 大学院生命体工学研究科），佐藤　しのぶ（九州工業大学 大学院工学研究院），竹中　繁織（九州工業大学 大学院工学研究院），安田　隆（九州工業大学 大学院生命体工学研究科）

著者名(英語): Takahiro Himuro (Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology), Ryo Araki (Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology), Shinobu Sato (Graduate School of Engineering, Kyushu Institute of Technology), Shigeori Takenaka (Graduate School of Engineering, Kyushu Institute of Technology), Takashi Yasuda (Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology)

キーワード: ナノワイヤ，DNA，金属被覆，還元基，インターカレータ，静電配向　　Nanowire，DNA，Metallization，Reducing group，Intercalator，Electrostatic orientation

要約(英語): We demonstrated that the DNA metallization technique using reducing group-labeled intercalator molecules permits dsDNA (double-stranded DNA) molecules to be specifically metallized while not permitting metallization of ssDNA (single-stranded DNA) molecules. First, dsDNA and ssDNA molecules were stretched on a mica surface using spin-coating technique, and metallization process was conducted. AFM observation showed that only dsDNA molecules were metallized, resulting in formation of nanowires with a diameter of about 11 nm. Secondly, dsDNA and ssDNA molecules were stretched and immobilized between two microelectrodes. Impedance analysis showed that the electrical conductivity of only dsDNA was drastically increased after the metallization process.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.136 No.10 （2016）

本誌掲載ページ: 425-431 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/136/10/136_425/_article/-char/ja/