高圧水素ガス環境用Cr-N薄膜ひずみセンサおよび圧力センサ

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2018/05/01

タイトル(英語): Strain Sensors and Pressure Sensors using Cr-N Thin Films for High Pressure Hydrogen Gas

著者名: 丹羽　英二（公益財団法人 電磁材料研究所），三上　浩（（株）昭和測器）

著者名(英語): Eiji Niwa (Research Institute for Electromagnetic Materials), Hiroshi Mikami (Showa Measuring Instruments CO., LTD.)

キーワード: 高圧水素ガス，Cr-N薄膜，ひずみセンサ，圧力センサ　　high pressure hydrogen gas，Cr-N thin film，strain sensor，pressure sensor

要約(英語): The authors investigated the influence of hydrogen on Cr-N strain sensitive thin films, which have a gauge factor of about 14, to develop a high sensitive strain sensor for high pressure hydrogen gas. As a result, it was found that the thin film was not affected by hydrogen and the specimen of Cr-N thin film on Zirconia substrate showed a sensitive and linear output to the pressure. It was considered that the Cr-N thin films were able to be expected as not only high sensitive strain sensors but also diaphragm-less pressure sensors in high pressure hydrogen gas.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.138 No.5 （2018） 特集：平成29年度センサ・マイクロマシン部門総合研究会

本誌掲載ページ: 178-184 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/138/5/138_178/_article/-char/ja/