Batch Fabrication of Nano-Gap Electrode Array Using Photo-Patterning and Resist UV-Curing

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2019/01/01

タイトル(英語): Batch Fabrication of Nano-Gap Electrode Array Using Photo-Patterning and Resist UV-Curing

著者名: Hai Minh Nguyen (Dept. of Advanced Science and Technology, Toyota Technological Institute), Mako Kumeuchi (Dept. of Advanced Science and Technology, Toyota Technological Institute), Shinya Kumagai (Dept. of Advanced Science and Technology, Toyota Technolo

著者名(英語): Hai Minh Nguyen (Dept. of Advanced Science and Technology, Toyota Technological Institute), Mako Kumeuchi (Dept. of Advanced Science and Technology, Toyota Technological Institute), Shinya Kumagai (Dept. of Advanced Science and Technology, Toyota Technological Institute), Kenji Ishikawa (Plasma Nanotechnology Research Center, Nagoya University), Masaru Hori (Plasma Nanotechnology Research Center, Nagoya University), Minoru Sasaki (Dept. of Advanced Science and Technology, Toyota Technological Institute)

キーワード: Nano-gap electrode，photolithography，UV-cured photoresist

要約(英語): A nano-gap electrode array is batch-fabricated based on photolithography. A high resolution is obtained by using an over-hanging resist cover on the under-etched metal film. The process includes two-time mask-patterning. The first photoresist is UV-cured, allowing second patterning without degrading the first pattern. A nano-gap width of 237±63 nm is obtained from a 704-electrode array with an yield of 97%.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.139 No.1 （2019） 特集：センサ・マイクロマシン英文特集号

本誌掲載ページ: 27-28 p

原稿種別: 研究開発レター／英語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/139/1/139_27/_article/-char/ja/