反応性スパッタリング法を用いた光導波路用SiCO薄膜の透明性向上

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2020/12/01

タイトル(英語): Transparency Improvement of SiCO Thin Film for Optical Waveguide with Reactive Sputtering Method

著者名: 新國　広幸（東京工業高等専門学校），沼田　千鶴（東京工業高等専門学校），山路　涼斗（長岡技術科学大学電気電子情報工学専攻），伊藤　浩（東京工業高等専門学校），川又　由雄（東京工業高等専門学校）

著者名(英語): Hiroyuki Nikkuni (National Institute of Technology, Tokyo College), Chizuru Numata (National Institute of Technology, Tokyo College), Ryoto Yamaji (Department of Electrical, Electronics and Information Engineering, Nagaoka University of Technology), Hiroshi Ito (National Institute of Technology, Tokyo College), Yoshio Kawamata (National Institute of Technology, Tokyo College)

キーワード: 光導波路，センサ，反応性スパッタリング，SiCO薄膜，光学的特性，機械的特性　　optical waveguide，sensor，reactive sputtering，SiCO thin film，optical characteristic，mechanical characteristic

要約(英語): In this study, the transparency of SiCO thin films for optical waveguides was improved by a reactive sputtering method with O2 as the reactive gas. Ten samples with different oxygen inflow ratios (fo) were prepared. As fo increased, the following effects were observed: an increase in O2, a decrease in the absorption coefficient, a widening of the optical gap, the relaxation of the internal stress, a reduction in the refractive index, and a reduction of the mechanical strength (hardness and young's modulus). It was found that these dependencies were stronger when fo ≦ 10%. Where fo = 7%, the thin film had a relatively high mechanical strength, refractive index, and optical gap (1.80 eV). In this case, the excellent optical and mechanical properties make the thin film suitable for an optical waveguide.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.140 No.12 （2020）

本誌掲載ページ: 369-373 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/140/12/140_369/_article/-char/ja/