誘電体薄膜の剥離手法に関する研究

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2021/02/01

タイトル(英語): Transfer of Ferroelectric Thin Film Capacitor Using Internal Stress of Plated Film

著者名: 末重　良宝（キヤノン（株）），藤野　真久（国立研究開発法人産業技術総合研究所），須賀　唯知（東京大学），一木　正聡（国立研究開発法人産業技術総合研究所）

著者名(英語): Kazutaka Sueshige (Canon Inc.), Masahisa Fujino (National Institute of Advanced Industrial Science and Technology (AIST)), Tadatomo Suga (The University of Tokyo), Masaaki Ichiki (National Institute of Advanced Industrial Science and Technology (AIST))

キーワード: 誘電体薄膜，剥離，ナノトランスファー法，めっき，内部応力_x000D_　　ferroelectric thin film，release，nano-transfer method，electro-plating，internal stress

要約(英語): The purpose of this article is for the establish of the releasing technologies of ferroelectric thin film capacitors using the internal stress of plated film. The stress analysis in simulation and the confirmation of experiment was carried out. As a result, it was demonstrated that the thin film capacitor can be actually released off. It was also confirmed that the performance as a capacitor after releasing was also good for the expected application.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.141 No.2 （2021）

本誌掲載ページ: 39-43 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/141/2/141_39/_article/-char/ja/