商品情報にスキップ
1 1

Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array

Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array

通常価格 ¥550 JPY
通常価格 セール価格 ¥550 JPY
セール 売り切れ
税込

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2022/01/01

タイトル(英語): Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array

著者名: Takeshi Onodera (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kengo Mieda (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kazuma Taniguchi (Graduate

著者名(英語): Takeshi Onodera (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kengo Mieda (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kazuma Taniguchi (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University)

キーワード: nanohole array,convective self-assembly,colloidal crystal,nanosphere lithography

要約(英語): To fabricate a nanohole array chip, a mask in nanosphere lithography was fabricated by drag-coating convective self-assembly using two glass slides. The relationship between the volume fraction of 500-nm-diameter polystyrene (PS) particles and the deposition rate under our experimental conditions was determined. Masks with a monolayer of PS particles were deposited on glass slides. Plasma etching of the PS particles was carried out to reduce their diameter. Au was sputtered over the mask, and the mask was then removed. Finally, a nanohole array was obtained using this simple procedure.

本誌: 電気学会論文誌E(センサ・マイクロマシン部門誌) Vol.142 No.1 (2022) 特集:センサ・マイクロマシン英文特集号

本誌掲載ページ: 15-16 p

原稿種別: 研究開発レター/英語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/142/1/142_15/_article/-char/ja/

販売タイプ
書籍サイズ
ページ数
詳細を表示する