Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array
Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array
カテゴリ: 論文誌(論文単位)
グループ名: 【E】センサ・マイクロマシン部門
発行日: 2022/01/01
タイトル(英語): Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array
著者名: Takeshi Onodera (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kengo Mieda (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kazuma Taniguchi (Graduate
著者名(英語): Takeshi Onodera (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kengo Mieda (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University), Kazuma Taniguchi (Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University)
キーワード: nanohole array,convective self-assembly,colloidal crystal,nanosphere lithography
要約(英語): To fabricate a nanohole array chip, a mask in nanosphere lithography was fabricated by drag-coating convective self-assembly using two glass slides. The relationship between the volume fraction of 500-nm-diameter polystyrene (PS) particles and the deposition rate under our experimental conditions was determined. Masks with a monolayer of PS particles were deposited on glass slides. Plasma etching of the PS particles was carried out to reduce their diameter. Au was sputtered over the mask, and the mask was then removed. Finally, a nanohole array was obtained using this simple procedure.
本誌: 電気学会論文誌E(センサ・マイクロマシン部門誌) Vol.142 No.1 (2022) 特集:センサ・マイクロマシン英文特集号
本誌掲載ページ: 15-16 p
原稿種別: 研究開発レター/英語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/142/1/142_15/_article/-char/ja/
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