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反応性スパッタリング法による光導波路用SiCO薄膜における膜特性のガス圧依存性

反応性スパッタリング法による光導波路用SiCO薄膜における膜特性のガス圧依存性

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カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2023/10/02

タイトル(英語): Gas Pressure Dependence of Optical and Mechanical Properties in a SiCO Thin Film for Optical Waveguide by Reactive Sputtering Method

著者名: 新國 広幸(東京工業高等専門学校),伊藤 浩(東京工業高等専門学校),高塚 侑(長岡技術科学大学)

著者名(英語): Hiroyuki Nikkuni (National Institute of Technology, Tokyo College), Hiroshi Ito (National Institute of Technology, Tokyo College), Yu Takatsuka (Nagaoka University of Technology)

キーワード: 光導波型センサ,光導波路,反応性スパッタリング法,SiCO薄膜,光学的特性,機械的特性  optical guided-wave sensor,optical waveguide,reactive sputtering method,SiCO film,optical characteristics,mechanical characteristics

要約(英語): In this study, the gas pressure dependence of optical and mechanical characteristics in reactive sputtered SiCO thin films for optical guided-wave pressure sensors was experimentally investigated. Thin films were fabricated by varying the gas pressure from 0.3 to 1.0 Pa at an oxygen flow ratio of 6%, and the gas pressure dependences was clarified. As the gas pressure increased, the optical bandgap of the SiCO thin film increased, resulting in a transparent SiCO films. On the other hand, the refractive index, young’s modulus and hardness decreased with increasing gas pressure. Combining this dependence with the oxygen inflow ratio dependence of the previous study, the first-order approximation formula for the gas pressure and oxygen flow rate ratio for various film characteristics was obtained. Based on this equation, trajectories of equal bandgaps and equal young's moduli on the oxygen flow ratio - gas pressure plane were created on the oxygen influx ratio-gas pressure coordinates, making it easy to fabricate waveguides with desired characteristics.

本誌: 電気学会論文誌E(センサ・マイクロマシン部門誌) Vol.143 No.10 (2023)

本誌掲載ページ: 326-330 p

原稿種別: 論文/日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/143/10/143_326/_article/-char/ja/

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