Electrical Properties of Fluorocarbon Polymer Films Obtained by Plasma Enhanced Chemical Vapor Deposition

カテゴリ: 全国大会

論文No: 1-142

グループ名: 【全国大会】平成14年電気学会全国大会論文集

発行日: 2002/03/26

タイトル(英語): Electrical Properties of Fluorocarbon Polymer Films Obtained by Plasma Enhanced Chemical Vapor Deposition

著者名: Costel Biloiu(Hokkaido University),Ioana-Arabela Biloiu (Hokkaido University),Yosuke Sakai(Hokkaido University),Hirotake Sugawara(Hokkaido University)

著者名(英語): Costel Biloiu(Division of Electronics and Information Engineering,Hokkaido University),Ioana-Arabela Biloiu(Division of Electronics and Information Engineering,Hokkaido University),Yosuke Sakai(Division of Electronics and Information Engineering,Hokkaido University),Hirotake Sugawara(Division of Electronics and Information Engineering,Hokkaido University)

キーワード: プラズマCVD|絶縁破壊電圧|二次電子放出|絶縁膜|フルオロカーボン|プラズマ

要約(日本語): The obtaining of fluorocarbon polymer films (FCPF) and their electrical proprieties are presented. FCPF have been deposited in a 13.56 MHz capacitively coupled reactor in two geometries: spherical and plan-parallel. As monomer gas perfluoro-octane C₈F₁₈ diluted with Ar have been used. Investigation of electrical proprieties of these films reveals a low dielectric constant (<= 2.5) and a low dielectric loss (<=0.001) for a wide range of frequencies. From breakdown measurements in nitrogen and argon gases effective electron yield of the order 10^-5 - 10^-6 has been obtained. The measurement of intrinsic breakdown voltage of FCPF showed a dependency against film thickness similar with that for polytetrafluoroethylene films.

原稿種別: 日本語

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