フラーレン生成用誘導熱プラズマ内流速と温度分布の圧力依存性

カテゴリ: 全国大会

論文No: 1-163

グループ名: 【全国大会】平成14年電気学会全国大会論文集

発行日: 2002/03/26

タイトル(英語): Pressure effect on gas flow and temperature fields in ICTP for fullerene synthesis

著者名: 稲崎 晃(金沢大学),白井 敏勝(金沢大学),田中 康規(金沢大学),作田 忠裕(金沢大学),松尾 廣伸(静岡大学),滝川 浩史(豊橋技術科学大学)

著者名(英語): Akira Inazaki(Kanazawa University),Toshikatsu Shirai(Kanazawa University),Yasunori Tanaka(Kanazawa University),Tadahiro Sakuta(Kanazawa University),Hironobu Matsuo(Shizuoka University),Hirofumi Takikawa(Toyohashi University of Technology)

キーワード: 誘導熱プラズマ|フラーレン|TOF-MS|数値解析|温度分布|流速分布

要約(日本語): Numerical calculation was carried out to obtain the temperature distribution and gas flow field in the reactor chamber for fullerene synthesis with a large scale inductively coupled thermal plasma. In this calculation, it was assumed that local thermal equilibrium was established in the chamber because of low electric field strength in it. The axial temperature distributions and gas flow fields in the 100%He plasma ware compared in two pressures; 20kPa and 67kPa. The result indicated that temperature distributions scarcely depend on the pressure, while axial gas flows depend on it.

原稿種別: 日本語

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