Characteristics of a hydrogen plasma in a surface wave plasma CVD apparatus

カテゴリ: 全国大会

論文No: 1-176

グループ名: 【全国大会】平成14年電気学会全国大会論文集

発行日: 2002/03/26

タイトル(英語): Characteristics of a hydrogen plasma in a surface wave plasma CVD apparatus

著者名: 金 載浩(東京大学),板垣 敏文(東京大学),桂井 誠(東京大学)

著者名(英語): Jaeho Kim(University of Tokyo),Toshifumi Itagaki(University of Tokyo),Makoto Katsurai(University of Tokyo)

キーワード: 表面波プラズマ|マイクロ波プラズマ|水素プラズマ|プラズマCVD|ラングミュアプローブ

要約(日本語): Recently hydrogen based plasma have been used for the deposition of thin films such as hydrogenated amorphous silicon, diamond-like hydrocarbon, and diamond. While a ring line dielectric surface wave plasma (RDL-SWP) apparatus have been considered as to be one of the next generation process plasma apparatus from various merits. In this study, to apply a RDL-SWP apparatus to a plasma chemical vapor deposition (CVD) the characteristics of hydrogen plasma were experimentally investigated. The profiles of electron density and electron temperature were measured using a movable Langmuir probe and the profiles were discussed.

原稿種別: 日本語

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