Study of High Pressure RF Ar-N ICPs Using SIT Inverter Power Supply

カテゴリ: 全国大会

論文No: 1-188

グループ名: 【全国大会】平成14年電気学会全国大会論文集

発行日: 2002/03/26

タイトル(英語): Study of High Pressure RF Ar-N ICPs Using SIT Inverter Power Supply

著者名: M. A. Razzak (名古屋大学),Kenji Kondo(名古屋大学),Yoshihiko Uesugi(名古屋大学),Shuichi Takamura(名古屋大学)

著者名(英語): M.A. Razzak(Nagoya University),Kenji Kondo(Nagoya University),Yoshihiko Uesugi(Nagoya University),Shuichi Takamura(Nagoya University)

要約(日本語): Low cost and high internal energy of nitrogen makes it one of the most commonly used arc gas to generate thermal plasma using ICP (Inductively Coupled Plasma) technique [1]. ICP has been drawn a considerable attention over the last few decades due to its interesting characteristics, various structural properties and wide range of industrial applications such as material processing, waste materials destruction and so on.This paper reports on the generation of high pressure Ar-N RF (Radio Frequency) induction thermal plasma reactor using SIT (Static Induction Transistor) inverter power supply [2].

原稿種別: 日本語

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