KCl基板上に作製されたVOPc薄膜の形態

カテゴリ: 全国大会

論文No: 2-110

グループ名: 【全国大会】平成15年電気学会全国大会論文集

発行日: 2003/03/17

タイトル(英語): Morphologies of VOPc Thin Films Prepared on KCl Substrate

著者名: 蒋琴 (愛知工業大学),澤 五郎(愛知工業大学),内田 悦行(愛知工業大学),大橋 朝夫(愛知工業大学),小嶋 憲三(愛知工業大学),落合 鎮康(愛知工業大学)

著者名(英語): Jiang Qin(Aichi Institute of Technology),Sawa Goro(Aichi Institute of Technology),Uchida Yoshiyuki(Aichi Institute of Technology),Ohashi Asao(Aichi Institute of Technology),Kojima Kenzo(Aichi Institute of Technology),Ochiai Shizuyasu(Aichi Institute of Technology)

キーワード: 分子線エピタキシー装置|KCl|VOPc

要約(日本語): Vanadylphthalocyanine (VOPc) thin films were fabricated on KCl(100) substrate by a molecular beam epitaxy. The morphologies of VOPc thin films fabricated under different preparing conditions were investigated by using Vis/UV spectra, AFM images and the third order nonlinear optical properties measured with Maker fringe. The morphology of VOPc thin film on a KCl substrate has three types. The first type has VOPc molecules tilted epitaxially on KCl substrate, the second type has pseudomorphic VOPc layers on the epitaxial layer, and the third type is the bulk VOPc crystals deposited on the pseudomorphic layer. The third order nonlinear optical susceptibility estimated from a maximum TH intensity of VOPc thin film measured by Maker fringe is about 10-9 esu. This is a practical value requested for the application to optical devices such as optical switching and memory.

原稿種別: 日本語

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