Nanocrystalline Diamond Film Depositions using Surface-Wave Excited Low Pressure Plasma

カテゴリ: 全国大会

論文No: 1-214

グループ名: 【全国大会】平成16年電気学会全国大会論文集

発行日: 2004/03/17

タイトル(英語): Nanocrystalline Diamond Film Depositions using Surface-Wave Excited Low Pressure Plasma

著者名: 金 載浩(東京大学),桂井 誠(東京大学)

著者名(英語): Jaeho Kim(University of Tokyo),Makoto Katsurai(University of Tokyo)

キーワード: 表面波プラズマ|マイクロ波プラズマ|プラズマCVD|ダイヤモンド薄膜|ナノクリスタルダイヤモンド

要約(日本語): Ordinary diamond films deposited by plasma CVDs are polycrystalline with a large grain size and rough surface. These properties make it be difficult the application of diamond films. Recently, nanocrystalline diamond films have been attracting attentions due to their small grain size and smooth surface. However, the development of CVD systems for the large area nanocrystalline diamond films with reliable properties is still an important problem. In this study, we applied a large-area surface-wave excited plasma to CVD for diamond film depositions at gas pressures below 100mTorr and proposed the superposition of DC powers to obtain high-quality diamond films. It is found that the superposition of DC power permits high electron densities, low electron temperatures, and low plasma space potentials. Nanocrystalline diamond films with a very smooth surface were obtained at a gas pressure of 30mTorr.

原稿種別: 日本語

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