高周波MEMS応用のための微小真空管製作

カテゴリ: 全国大会

論文No: 3-144

グループ名: 【全国大会】平成17年電気学会全国大会論文集

発行日: 2005/03/15

タイトル(英語): The Micro Vacuum Tube Fabrication for RFMEMS Application

著者名: 山下 清隆(東京大学),Sun Winston(東京大学),角嶋 邦之(東京大学),藤田 博之(東京大学),年吉 洋(東京大学)

著者名(英語): Kiyotaka Yamashita(Institute of Industrial Science The University of Tokyo),Sun Winston(Institute of Industrial Science The University of Tokyo),kuniyuki Kakushima(Institute of Industrial Science The University of Tokyo),Hiroyuki Fujita(Institute of Industrial Science The University of Tokyo),Hiroshi Toshiyoshi(Institute of Industrial Science The University of Tokyo)

キーワード: MEMS|真空マイクロエレクトロニクス|電界放出

要約(日本語): In this paper, we report a new micro fabrication technique to develop a pair of sharp silicon tips that could be potentially used for field-emitter in the vacuum for RF-MEMS band-pass filters. An SOI wafer was first patterned by DRIE and then processed in a TMAH solution to sharpen the tips (radius of curvature 50 nm, tip separation 5 um). Current-voltage characteristics observed in high vacuum (2 x 10-8 Torr) were well explained by the Fowler-.Nordheim theory, which indicated that the device operated by the field-emission. Typical emission current was 4 nA under an emitter-anode potential difference of 300V.

原稿種別: 日本語

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