Film Thickness Dependence of Third-Harmonic Generation from Poly(3-hexylthiophene) on Quartz Glasses with Surface Modification

カテゴリ: 全国大会

論文No: 2-117

グループ名: 【全国大会】平成20年電気学会全国大会論文集

発行日: 2008/03/19

タイトル(英語): Film Thickness Dependence of Third-Harmonic Generation from Poly(3-hexylthiophene) on Quartz Glasses with Surface Modification

著者名: Xin WANG(愛知工業大学),落合 鎮康(愛知工業大学),小嶋 憲三(愛知工業大学),水谷 照吉(愛知工業大学)

著者名(英語): Xin Wang(Aichi Institute of Technology),Shizuyasu Ochiai(Aichi Institute of Technology),Kenzo Kojima(Aichi Institute of Technology),Teruyoshi Mizutani(Aichi Institute of Technology)

要約(日本語): The third-order nonlinear optical (NLO) properties of regioregular poly(3-hexylthiophene) thin films with different film thicknesses were investigated by the third harmonic generation (THG) technique. Structures of the P3HT films were characterized by UV-visible absorption spectra and out-of-plane X-ray diffraction. The effect of surface modification of the quartz glass substrate by hexamethyldisilazane (HMDS) on the film structure was also studied. Results revealed the surface modification effects on the RR-P3HT film structures during the initial stage of film formation, and the importance of increased crystallinity and higher ordering (enhanced inter-molecular interactions through PI-PI stacking) to the enhancement of its third-order NLO susceptibilities for applications in NLO devices.

原稿種別: 日本語

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