Development of Slower Wet Etching Rates Measurement of α-Quartz

カテゴリ: 全国大会

論文No: 3-126

グループ名: 【全国大会】平成23年電気学会全国大会論文集

発行日: 2011/03/05

タイトル(英語): Development of Slower Wet Etching Rates Measurement of α-Quartz

著者名: 林 碩(早稲田大学),大井川 寛(早稲田大学),趙 萌(早稲田大学),植田 敏嗣(早稲田大学)

著者名(英語): Shuo Lin(Waseda University),Hiroshi Oigawa(Waseda University),Meng Zhao(Waseda University),Toshitsugu Ueda(Waseda University)

要約(日本語): Currently, quartz crystal draws great attentions for its piezoelectricity, excellent mechanical characteristics and electrical insulation similar to the conventional MEMS material, silicon. However, one of the problems of quartz crystal is its complex anisotropic etching profiles came from its crystal structure in wet etching. The etching rates vertical to z axis quite slow and very difficult to do precise measurement, but they are important to the formation of etching shapes in experiments and simulations. This research aims at finding a new method to measure wet etching rates on the plane which is vertical to z axis of quartz crystal and focuses on constructing experimental conditions and acquiring initial etch rate data.

原稿種別: 日本語

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