3D Single Concave Vertex Anisotropic Etching Simulation for AT-cut Quartz Wafer

カテゴリ: 全国大会

論文No: 3-143

グループ名: 【全国大会】平成26年電気学会全国大会論文集

発行日: 2014/03/05

タイトル(英語): 3D Single Concave Vertex Anisotropic Etching Simulation for AT-cut Quartz Wafer

著者名: 張 煜(早稲田大学),大井川 寛(早稲田大学),趙 萌(早稲田大学),池沢 聡(早稲田大学),植田 敏嗣(早稲田大学)

著者名(英語): Yu Zhang(Waseda University),Hiroshi Oigawa(Waseda University),Meng Zhao(Waseda University),Satoshi Ikezawa(Waseda University),Toshitsugu Ueda(Waseda University)

キーワード: MEMS|crystal quartz wafer|anisotropic etching|3D etching simulation|hull construction|AT-cut

要約(日本語): Quartz crystal is acknowledged as one of suitable material for fabricating some specific MEMS devices as its excellent properties can complement those of silicon. This study mainly aims at establishing a user-friendly 3D etching simulator for quartz to better guide etching process and shorten developing period of quartz MEMS devices. We focus on etching simulation of 3D concave vertex of AT-cut wafer with improved database processing method and simulation method based on hull construction. The consistency between simulation result and experiment result shows that our method and process can well predict the 3D anisotropic etching profile of concave vertexes for AT-cut wafer.

原稿種別: 日本語

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