Multi-Patterning with Numerical Optimization for DMD-Based Three-Dimensional Lithography

カテゴリ: 全国大会

論文No: 3-146

グループ名: 【全国大会】平成28年電気学会全国大会論文集

発行日: 2016/03/05

タイトル(英語): Multi-Patterning with Numerical Optimization for DMD-Based Three-Dimensional Lithography

著者名: Xiaoxu Ma(Kyoto University),Yoshiki Kato(Kyoto University),Floris Kempen(TU Delft),Yoshikazu Hirai(Kyoto University),Toshiyuki Tsuchiya(Kyoto University),Fred Keulen(TU Delft),Osamu Tabata(Kyoto University)

著者名(英語): Xiaoxu Ma(Kyoto University),Yoshiki Kato(Kyoto University),Floris Kempen(TU Delft),Yoshikazu Hirai(Kyoto University),Toshiyuki Tsuchiya(Kyoto University),Fred Keulen(TU Delft),Osamu Tabata(Kyoto University)

キーワード: リソグラフィ,シミュレーション,立体加工

要約(日本語): We report a multi-patterning approach utilizing digital-micromirror-device (DMD)-based 3D lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position comparing to the outer region of depth of focus. Thus, for thick-film resist microstructuring, exposing with multiple focal positions with separate grayscale masks leads to improvement of fabrication accuracy. In order to find the best combination of the multiple focal positions and their grayscale masks, the computational optimization is combined to the proposed approach. Through a several experiments, effectiveness of the proposed approach was successfully demonstrated.

原稿種別: 英語

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