Fabrication of Thin and Wide Hybrid Emission Filters Using a Plasma Etching Technique

カテゴリ: 全国大会

論文No: 3-129

グループ名: 【全国大会】令和3年電気学会全国大会論文集

発行日: 2021/03/01

タイトル(英語): Fabrication of Thin and Wide Hybrid Emission Filters Using a Plasma Etching Technique

著者名: RustamiErus（Nara Institute of Science and Technology）,SasagawaKiyotaka（Nara Institute of Science and Technology）,PakpuwadonThanet（Nara Institute of Science and Technology）,OhtaYasumi（Nara Institute of Science and Technology）,TakeharaHironori（Nara Institut

著者名(英語): Erus Rustami (Nara Institute of Science and Technology),Kiyotaka Sasagawa (Nara Institute of Science and Technology),Thanet Pakpuwadon (Nara Institute of Science and Technology),Yasumi Ohta (Nara Institute of Science and Technology),Hironori Takehara (Nar

キーワード: |Lens-less imaging|Fluorescence emission|Absorption filter|Interference filter|Plasma etching|Green fluorescent protein

要約(英語): The complementary structure of interference and absorption filter plays a crucial role in achieving a high rejection ratio for lens-less fluorescence imaging systems. However, such hybrid filters for implantable devices that require a low-invasive feature

原稿種別: 英語

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